Plasma and Vacuum

Chairmen: Dr. Stephen Muhl Saunders (IIM-UNAM)

Plasma and vacuum science and technology are widely used in the great number today´s industries, as well as in many of the synthesis and characterization processes used in materials science. Plasmas are conductive assemblies of charged particles and fields that exhibit collective effects. Plasmas are the most common form of matter, comprising more than 99% of the known universe.

The word "PLASMA" was first applied to ionized gas by Dr. Irving Langmuir, an American chemist and physicist, in 1929.

Plasma research has resulted in a greater understanding of the universe, and it also provides many practical uses: new manufacturing techniques, consumer products, and the prospect of abundant energy.

Vacuum Technology is the term applied to all processes and physical measurement carried out under conditions of below-normal atmospheric pressure.

For any vacuum process, the limiting parameter for the maximum permissible pressure can be defined by:

• The number of molecules per unit volume (reasons 1 and 2),
• The mean free path (reason 3),
• Or the time required to form a monolayer (reason 4).

The first major use of vacuum technology in industry occurred about 1900 in the manufacture of electric light bulbs. Other devices requiring a vacuum for their operation followed, such as various types of electron tube.

Although plasma and vacuum science and technology is often considered to be a mature field with little new developments, in fact, arc processes, nanotechnology and biomaterials continue to provide and demand new research in this field. We invite you to present in our symposium your latest research, observations and developments in this very important basic area of study.

The contributions to this symposium will be considered for the poster session.