Atomic Layer Deposition

Dr. Pierre Giovanni Mani González: (UACJ),
Dr. Eduardo Martínez Guerra: (CIMAV-Monterrey),
Dr. Edgard López Luna: (UASLP),

The purpose of this symposium is to provide a forum for the discussion about basic issues and state the art applications of atomic layer deposition (ALD). The topics include:

 • Simulation, Modeling and Theory of ALD
 • Precursors and Chemistry
 • Surface Functionalization
 • Structural, chemical and electrical characterization.
 • Growth and Nucleation in the Ultra-Thin Regime
 • Novel Materials
 • Plasma-Enhanced ALD
 • Molecular Layer Deposition
 • Others.